AMSTERDAM.- Are you a young and talented photographer? This is your change to get your work published in
Foam Magazine, a distinctive and highly regarded international photography magazine.
Foam Magazine is scouting young photography talent for its annual Talent issue due in September 2009. The winners will get the chance to have their work published in Foam Magazine. All types of photography will be considered, including photojournalism, fashion, documentary and fine art photography.
Last year Foam Magazine received over 300 submissions from 46 different countries. Curtis Mann, Ahmet Unver, Pieter Hugo, Sarah Pickering and Wayne Liu were among the twelve photographers who showed their outstanding work in Foam Magazine #16. For the upcoming Talent issue #20, Foam Magazine hopes to receive even more submissions from around the globe.
The Talent issue originates from the first KLM Paul Huf Award in 2007, which left Foam_Fotografie Museum Amsterdam with so much unpublished talent that Foam Magazine decided to launch an open talent call. Foam Magazine's annual Talent issue offers upcoming photographers a stepping-stone in their careers by giving them the opportunity to publish their work. Besides this we also take photographers who have been nominated for the KLM Paul Huf Award and for the Joop Swart Masterclass, organized by World Press Photo, into consideration.
Foam Magazine is a quarterly international photography magazine published by Foam_Fotografie Museum Amsterdam and Vandejong Communications. It is a distinctive and highly appreciated publication. Foam Magazine serves as an exhibition space that embraces every aspect of photography. Every issue features a specific theme.
For more information on the submission requirements, interviews and tips from previous talents go to
www.foammagazine.nl. You can submit your work until the 18th of May